29. Cohan, J. W.; Berube, A. D.; Chavez, D.; Davis, Luke M.,* “Chemical vapor deposition of zirconium(IV) sulfide on flexible polymers,” J. Vac. Sci. Technol. A 2025, accepted. doi: 10.26434/chemrxiv-2025-nglg7
28. Cohan, J. W.; Chavez, D.; Berube, A. D.; Davis, Luke M.,* “Low-Temperature Chemical Vapor Deposition of Zirconium(IV) Sulfide Thin Films,” in revision. doi: 10.26434/chemrxiv-2025-q2bbk
27. Schrader, C. M.; Mittal, S.; Davis, Luke M.,* “Efficient reduction of cobalt oxide and nickel oxide using ammonia as a method for critical metal decarbonization,” in revision. doi: 10.2139/ssrn.5211462
26. Mittal, S.; Davis, Luke M.,* “Rapid, Efficient Reduction of Iron Oxide with Ammonia,” Cell Reports Physical Science, 2025, 6, 102551. doi: 10.1016/j.xcrp.2025.102551
25. Chavez, D.; Berube, A. D.; Davis, Luke M.,* “Zirconium disulfide single crystal, ZrS2(0001), characterized by X-ray photoelectron spectroscopy,” Surface Science Spectra, 2025, 32, 014004. (Highlighted in March 2025 AVS Newsletter) doi: 10.1116/6.0004276
24. Romeo, J. R.; Lucera, J. D.; Jensen, D.; Davis, Luke M.; Bennett, C. S.,* “Application of Redox-Active Ester Catalysis to the Synthesis of Pyranose Alkyl C-Glycosides,” Org. Lett., 2023, 25, 3760-3765. doi: 10.1021/acs.orglett.3c01228
23. Fountain, J. N.; Hawker, M. J.; Hartle, L.; Wu, J.; Montanari, V.; Sahoo, J. K.; Davis, Luke M.;* Kaplan, D.;* Kumar, K.,* “Towards Non-Stick Silk: Tuning the Hydrophobicity of Silk Fibroin Protein,” ChemBioChem 2022, 23, e202200429. (Cover article, Very Important Paper) doi: 10.1002/cbic.202200429
22. Yan, Y.; Feeney, M.; Davis, Luke M.; Thomas III, S. W.,* “Tuning Stiffness of Free-Standing Hydrogen-Bonded LbL films with Fe3+ Coordination,” ACS Appl. Polym. Mater. 2022, 4, 5380-5386. doi: 10.1021/acsapm.2c00431
21. Chang, C. M.; Davis, Luke M.; Spear, E. K.; Gordon, R. G.,* “Chemical Vapor Deposition of Transparent, p-Type Cuprous Bromide Thin Films,” Chem. Mater. 2021, 33, 1426-1434. doi: 10.1021/acs.chemmater.0c04586
Patents:
P3. Mittal, Sanya; Davis, Luke M., “Methods for reducing metal oxides with ammonia gas,” International Application No. PCT/US24/33612, June 12, 2024. Pending. (Priority to US Provisional Application No. 63/508,179, June 14, 2023.)
P2. Spear, Eliza K.; Davis, Luke M.; Gordon, R. G., “Methods for Vapor Deposition of Metal Halides,” US Patent Application No. 18/204,342, May 31, 2023. Pending. (Priority to US Provisional Application No. 63/347,325, May 31, 2022.)
P1. Chang, Christina M.; Davis, Luke M.; Gordon, R. G., “Copper Halide Layers,” US Patent No. 12,252,784, issued March 18, 2025.
From research prior to Tufts University:
20. Jayaraman, A.; Kim, S. B.; Davis, Luke M.; Lou, X.; Zhao, X.; Gordon, R. G.,* “A simple thermal vapor deposition process for and characterization of n-type indium oxysulfide thin films,” J. Vac. Sci. Technol. A 2022, 40, 062402. (Editor’s pick) doi: 10.1116/6.0001997
19. Zhao, X.; Davis, Luke M.; Lou, X.; Kim, S. B.; Uličná, S.; Jayaraman, A.; Yang, C.; Schelhas, L. T.; Gordon, R. G.,* “Study of the crystal structure of SnS thin films by atomic layer deposition,” AIP Adv. 2021, 11, 035144. (Featured article) doi: 10.1063/5.0032782
18. Kim, S. B.; Zhao, X.; Davis, Luke M.; Jayaraman, A.; Yang, C.; Gordon, R. G.,* “Atomic Layer Deposition of Tin Monosulfide Using Vapor from Liquid Bis(N,N’-diisopropylformamidinato)tin(II) and H2S,” ACS Appl. Mater. Interfaces 2019, 11, 45892-45902. doi: 10.1021/acsami.9b16933
17. Tong, L.; Davis, Luke M.; Gong, X.; Feng, J.; Beh, E. S.; Gordon, R. G.,* “Synthesis of Volatile, Reactive Coinage Metal 5,5-Bicyclic Amidinates with Enhanced Thermal Stability for Chemical Vapor Deposition,” Dalton Trans. 2019, 48, 6709-6713. doi: 10.1039/C9DT01202H
16. Heasley, R.; Davis, Luke M.; Chua, D.; Chang, C. M.; Gordon, R. G.,* “Vapor Deposition of Transparent, p‑Type Cuprous Iodide Via a Two-Step Conversion Process,” ACS Appl. Energy Mater. 2018, 1, 6953-6963. doi: 10.1021/acsaem.8b01363
15. Kim, S. B.; Jayaraman, A.; Chua, D.; Davis, Luke M.; Zheng, S.-:L.; Zhao, X.; Lee, S.; Gordon, R. G.,* “Obtaining a Low and Wide Atomic Layer Deposition Window (150-275 °C) for In2O3 Films Using an InIII Amidinate and H2O,” Chem. Eur. J. 2018, 24, 9525-9529. doi: 10.1002/chem.201802317
14. Heasley, R.; Chang, C. M.; Davis, Luke M.; Liu, K.; Gordon, R. G.,* “Vapor deposition of copper(I) bromide films via a two-step conversion process,” J. Vac. Sci. Technol. A. 2017, 35, 01B109. (Editor’s pick) doi: 10.1116/1.4967726
13. Kim, S. B.; Yang, C.; Powers, T.; Davis, Luke M.; Lou, X.; Gordon, R. G.,* “Synthesis of Calcium(II) Amidinate Precursors for Atomic Layer Deposition through a Redox Reaction between Calcium and Amidines,” Angew. Chem. Int. Ed. 2016, 55, 10228-10233. (Frontispiece) doi: 10.1002/anie.201602406
12. Zhang, P.; Babar, S.; Abelson, J. R.;* Sahoo, S.; Zhu, M.; Kautzky, M.; Davis, Luke M.; Girolami, G. S., “Iron-cobalt alloy thin films with high saturation magnetizations grown by conformal metalorganic CVD,” J. Vac. Sci. Technol. A. 2015, 33, 061521. doi: 10.1116/1.4935449
11. Babar, S.; Davis, Luke M.; Zhang, P.; Mohimi, E.; Girolami, G. S.; Abelson, J. R.,* “Chemical Vapor Deposition of Copper: Use of a Molecular Inhibitor to Afford Uniform Nanoislands or Smooth Films,” ECS J. Solid State Sci. Technol. 2014, 3, Q79-Q83. doi: 10.1149/2.009405jss
10. Cloud, A. N.; Davis, Luke M.; Girolami, G. S.;* Abelson, J. R.,* “Low-temperature CVD of iron, cobalt, and nickel nitride thin films from bis[di(tert-butyl)amido]metal(II) precursors and ammonia,” J. Vac. Sci. Technol. A 2014, 32, 020606. doi: 10.1116/1.4865903
9. Spicer, T. S.; Spicer, C. W.; Cloud, A. N.; Davis, Luke M.; Girolami, G. S.;* Abelson, J. R.,* “Low-temperature CVD of η-Mn3N2-x from bis[di(tert-butyl)amido]manganese(II) and ammonia,” J. Vac. Sci. Technol. A 2013, 31, 030604. doi: 10.1116/1.4799036
8. Davis, Luke M.; Stukenbroeker, T. S.; Abelt, C. J.; Scott, J. L.; Orlova, E.; Thompson, D. W.,* “Latent patterned surface metallization of silver ion-doped polyimide films,” Mater. Res. Soc. Symp. Proc. 2009, 1192, PP11-05. doi: 10.1557/PROC-1192-PP11-05
7. Thompson, D. S.; Davis, Luke M.; Thompson, D. W.;* Southward, R. E., “Single-Stage Synthesis and Characterization of Reflective and Conductive Silver-Polyimide Films Prepared from Silver(I) Complexes with ODPA/4,4′-ODA,” ACS Appl. Mater. Interfaces 2009, 1, 1457-1466. doi: 10.1021/am900133a
6. Davis, Luke M.;* Abelt, C. J.; Scott, J. L.; Orlova, E.; Thompson, D. W.,* “Latent Synthesis of Electrically Conductive Surface-Silvered Polyimide Films,” ACS Appl. Mater. Interfaces 2009, 1, 204–210. doi: 10.1021/am800023b
5. Davis, Luke M.; Thompson, D. S.; Thompson, D. W.;* Southward, R. E., “Silver-Polyimide Nanocomposite Films: A Single-Stage Thermally-Induced Metallization of Aromatic Fluorinated Polyimides Yielding Highly Reflective Films,” Polyimides and Other High Temperature Polymers 2007, 4, 261-286. doi: 10.1201/b12204-13
4. Davis, Luke M.;* Thompson, D. W., “Novel and Facile Approach to the Fabrication of Metal-Patterned Dielectric Substrates,” Chem. Mater. 2007, 19, 2299-2303. doi: 10.1021/cm062372y
3. Davis, Luke M.; Thompson, D. S.; Dean, C. J.; Pevzner, M.; Scott, J. L.; Broadwater, S. T.; Thompson,D. W.;* Southward, R. E., “Silver-Polyimide Nanocomposite Membranes: Macro-molecular Matrix-Mediated Metallization of an Aromatic Fluorinated Polyimide Yielding Highly Reflective Films at Low Metal Concentrations,” J. Appl. Polym. Sci. 2007, 103, 2409-2418.doi: 10.1002/app.25384
2. Davis, Luke M.; Compton, J. M.; Kranbuehl, D. E.; Thompson, D. W.;* Southward, R. E., “Reflective and Electrically Conductive Palladium Surface-Metallized Polyimide Nanocomposite Membranes,” J. Appl. Polym. Sci. 2006, 102, 2708-2716. doi: 10.1002/app.24162
1.French, B. L.; Davis, Luke M.; Munzinger, E. S.; Slavin, J. W. J.; Christy, P. C.; Thompson, D. W.;* Southward, R. E.,* “Palladium-Polyimide Nanocomposite Membranes: Synthesis and Characterization of Reflective and Electrically Conductive Surface-Metallized Films,” Chem. Mater. 2005, 17, 2091-2100. doi: 10.1021/cm040378m
Notes:
Undergraduate author; *: corresponding author